Growth and physical properties of highly oriented La-doped (K,Na)NbO3 ferroelectric thin films

THIN SOLID FILMS

卷:577

Article

Vendrell, X.¹  Raymond, O.²  Ochoa, D. A.³  Garcia, J. E.³  Mestres, L.¹ 

[1] Univ Barcelona, Dept Quim Inorgan, E-08028 Barcelona, Spain

[2] Univ Nacl Autonoma Mexico, Ctr Nanociencias & Nanotecnol, Ensenada 22860, Baja California, Mexico

[3] Univ Politecn Cataluna, BarcelonaTech, Dept Appl Phys, ES-08034 Barcelona, Spain

关键词: Chemical solution deposition;    (K0.5Na0.5)NbO3;    Ferroelectric;    Thin films;   

DOI  :  10.1016/j.tsf.2015.01.038

来源: Elsevier

【 摘 要 】

Lead-free (K,Na)NbO3 (KNN) and La doped (K,Na)NbO3 (KNN-La) thin films are grown on SrTiO3 substrates using the chemical solution deposition method. The effect of adding different amounts of Na and K excess (0-20 mol%) is investigated. The results confirm the necessity of adding 20 mol% excess amounts of Na and K precursor solutions in order to avoid the formation of the secondary phase, K4Nb6O17, as confirmed by X-ray diffraction and Raman spectroscopy. Moreover, when adding a 20 mol% of alkaline metal excess, the thin films are highly textured with out-of-plane preferential orientation in the [100] direction of the [100] orientation of the substrate. Doping with lanthanum results in a decrease of the leakage current density at low electric field, and an increase in the dielectric permittivity across the whole temperature range (80-380 K). Although the (100)-oriented KNN and KNN-La films exhibited rounded hysteresis loops, at low temperatures the films show the typical ferroelectric hysteresis loops. (C) 2015 Elsevier B.V. All rights reserved.

【 授权许可】

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