Fully dense, non-faceted 111-textured high power impulse magnetron sputtering TiN films grown in the absence of substrate heating and bias

THIN SOLID FILMS

卷:518

Letter

Lattemann, M.^1,2,3,4  Helmersson, U.⁴  Greene, J. E.^5,6,7 

[1] Tech Univ Darmstadt, Joint Res Lab Nanomat, D-64287 Darmstadt, Germany

[2] Karlsruhe Inst Technol, D-64287 Darmstadt, Germany

[3] Karlsruhe Inst Technol, Inst Nanotechnol, Karlsruhe, Germany

[4] Linkoping Univ, IFM Mat Phys, Plasma & Coatings Phys Div, S-58183 Linkoping, Sweden

[5] Univ Illinois, Dept Mat Sci, Urbana, IL 61801 USA

[6] Univ Illinois, Dept Phys, Urbana, IL 61801 USA

[7] Univ Illinois, Frederick Seitz Mat Res Lab, Urbana, IL 61801 USA

关键词: Pulsed magnetron sputtering;    High power impulse magnetron sputtering (HiPIMS);    High power pulsed magnetron sputtering (HPPMS);    Titanium nitride;    Transmission electron microscopy;    Thin films;    Nucleation and growth;    Ion-assisted deposition;   

DOI  :  10.1016/j.tsf.2010.05.064

来源: Elsevier

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