Optimization of KOH etching process to obtain textured substrates suitable for heterojunction solar cells fabricated by HWCVD

THIN SOLID FILMS

卷:517

Article; Proceedings Paper

Munoz, D.¹  Carreras, P.¹  Escarre, J.¹  Ibarz, D.¹  Martin de Nicolas, S.²  Voz, C.²  Asensi, J. M.¹  Bertomeu, J.¹ 

[1] Univ Barcelona, XaRMAE, Dept Fis Aplicada & Opt, E-08028 Barcelona, Spain

[2] Univ Politecn Cataluna, Grp Recerca Micro & Nanotecnol, ES-08034 Barcelona, Spain

关键词: Hot-wire CVD;    Solar cells;    Heterojunctions;    c-Si texturing;   

DOI  :  10.1016/j.tsf.2009.01.024

来源: Elsevier

【 摘 要 】

In this work, we have studied the texturization process of (100) c-Si wafers using a low concentration potassium hydroxide solution in order to obtain good quality textured wafers. The optimization of the etching conditions have led to random but uniform pyramidal structures with good optical properties. Then, symmetric heterojunctions were deposited by Hot-Wire CVD onto these substrates and the Quasi-Steady-State PhotoConductance technique was used to measure passivation quality. Little degradation in the effective lifetime and implicit open circuit voltage of these devices (<20 mV) was observed in all cases. It is especially remarkable that for big uniform pyramids, the open-circuit voltage is comparable to the values obtained on flat substrates. (C) 2009 Elsevier B.V. All rights reserved.

【 授权许可】

Free