Texture and microstructure of Cr2O3 and (Cr,Al)2O3 thin films deposited by reactive inductively coupled plasma magnetron sputtering

THIN SOLID FILMS

卷:518

Article

Pedersen, K.^2,3  Bottiger, J.^2,3  Sridharan, M.^2,3  Sillassen, M.^2,3  Eklund, P.^1,2,3 

[1] Linkoping Univ, Thin Film Phys Div FunMat, Dept Phys Chem & Biol IFM, SE-58183 Linkoping, Sweden

[2] Univ Aarhus, Interdisciplinary Nanosci Ctr iNANO, DK-8000 Aarhus C, Denmark

[3] Univ Aarhus, Dept Phys & Astron, DK-8000 Aarhus C, Denmark

关键词: Alumina;    Chromia;    Physical vapor deposition;    Coatings;    Preferred orientation;    X-ray diffraction;   

DOI  :  10.1016/j.tsf.2010.01.008

来源: Elsevier

【 摘 要 】

Cr2O3 and (Cr,Al)(2)O-3 films were grown using reactive dc and inductively coupled plasma magnetron sputtering at substrate temperatures of 300-450 degrees C. For pure chromia, alpha-Cr2O3 films with fiber texture were grown; the out-of-plane texture could be controlled from < 0001 > to <10<(1)over bar>4>. The former texture was obtained as a consequence of competitive growth with no applied bias or inductively coupled plasma, while the latter was obtained at moderate bias ( - 50 V), probably due to recrystallization driven by ion-bombardment-induced strain. By reactive codeposition of Cr and Al, a corundum-structured metastable solid solution alpha-(Cr,Al)(2)O-3 with Cr/Al ratios of 2-10 was grown with a dense, fine-grained morphology. Hardness and reduced elastic modulus values were in the ranges 24-27 GPa and 190-230 GPa, respectively. (C) 2010 Elsevier B.V. All rights reserved.

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