Single-phase anatase structure and dominant metallic Ge in Ge/TiO2 multi-layer films using a differential pumping co-sputtering system

THIN SOLID FILMS

卷:562

Article

Abe, Seishi¹  Adachi, Yoshitaka²  Matsuda, Kenji³  Nose, Masateru⁴ 

[1] Res Inst Electromagnet Mat, Sendai, Miyagi 9820807, Japan

[2] Toyama Univ, Grad Sch Sci & Engn Educ, Toyama 9308555, Japan

[3] Toyama Univ, Grad Sch Sci & Engn Res, Toyama 9308555, Japan

[4] Toyama Univ, Fac Art & Design, Takaoka, Toyama 9338588, Japan

关键词: X-ray diffraction;    Transmission electron microscopy;    Transmittance;    Radio-frequency sputtering;    X-ray photoelectron spectroscopy;    Germanium;    Titanium dioxide;   

DOI  :  10.1016/j.tsf.2014.03.080

来源: Elsevier

【 摘 要 】

This study investigates the preparation of Ge/TiO2 multi-layer films using a differential-pumping co-sputtering system (DPCS). This system has two chambers with different atmospheres, pure Ar for the Ge target and 0.5%O-2 in Ar for the TiO2 ceramic target. The optical absorption spectra of the multi-layer films obviously shift to visible and near-infrared regions with increasing Ge layer thickness, while keeping O/Ti composition ratios of 2.3 +/- 0.1 in TiO2. X-ray diffraction results indicate that the TiO2 layer forms a single-phase anatase structure in the multi-layer films. X-ray photoelectron spectroscopy also indicates that metallic Ge is dominant in the multi-layer film with negligible Ge-oxide. Therefore, DPCS provides a multi-layer film with a single-phase anatase structure in the TiO2 layer and a dominant metallic element in the Ge layer. (C) 2014 Elsevier B.V. All rights reserved.

【 授权许可】

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