Assessment of candidate metallization systems deposited on diamond using nano-indentation and nano-scratching tests

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Article

Msolli, S.¹  Alexis, J.²  Kim, H. S.¹  Dalverny, O.²  Karama, M.² 

[1] Dongguk Univ Seoul, Dept Mech Robot & Energy Engn, 30 Pildong Ro 1 Gil, Seoul 100715, South Korea

[2] Univ Toulouse, INP ENIT, LGP, 47 Ave Azereix, F-65013 Tarbes, France

关键词: Diamond;    Metallization;    Deposition;    Nano-indentation;    Nano-scratching;    Power electronics;   

DOI  :  10.1016/j.tsf.2016.10.022

来源: Elsevier

【 摘 要 】

Mechanical suitability of ohmic contacts among the select metallization systems, deposited on a p-type heavily boron-doped homoepitaxial diamond layer, was evaluated via mechanical tests on the nanoscale. Two candidate metallization systems were considered: Si/Al and Ti/Pt/Au. Metallizations were performed using two different techniques: plasma-enhanced chemical vapour deposition and lift-off. Effectiveness of the techniques was assessed via mechanical tests on the microscale and the nanoscale. Nano-indentation experiments were performed to determine the mechanical properties of the layers. Nano-scratching experiments were used to evaluate the mechanical adhesion on the diamond substrate. Scanning electron microscopy was applied for observation of the morphology of the surface and the indent and for detecting defects. (C) 2016 Elsevier B.V. All rights reserved.

【 授权许可】

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