Optical and structural characterization of orthorhombic LaLuO3 using extreme ultraviolet reflectometry

THIN SOLID FILMS

卷:680

Article

Tryus, Maksym^1,7  Nikolaev, Konstantin, V²  Makhotkin, Igor A.²  Schubert, Juergen^3,7  Kibkalo, Lidia^3,7  Danylyuk, Serhiy^4,7  Giglia, Angelo⁵  Nicolosi, Piergiorgio⁶  Juschkin, Larissa^1,3,7 

[1] Rhein Westfal TH Aachen, Chair Expt Phys Extreme Ultraviolet, Steinbachstr 15, D-52074 Aachen, Germany

[2] Univ Twente, MESA Inst Nanotechnol, Ind Focus Grp XUV Opt, POB 217, NL-7500 AE Enschede, Netherlands

[3] Forschungszentrum Julich, Peter Grunberg Inst PGI 9, D-52425 Julich, Germany

[4] Rhein Westfal TH Aachen, Chair Technol Opt Syst, Steinbachstr 15, D-52074 Aachen, Germany

[5] Italian Natl Res Council, CNR, IOM, I-34149 Trieste, Italy

[6] Univ Padua, Dept Informat Engn, IFN CNR OUS, Via Gradenigo 6B, I-35131 Padua, Italy

[7] Forschungszentrum Julich, JARA FIT Julich Aachen Res Alliance Fundamentals, D-52425 Julich, Germany

关键词: Orthorhombic LaLuO3;    Optical constants;    Extreme ultraviolet reflectometry;    Thin films characterization;   

DOI  :  10.1016/j.tsf.2019.04.037

来源: Elsevier

【 摘 要 】

A thin orthorhombic LaLuO3 film, grown on SrTiO3 substrate by pulsed laser deposition, is characterized using multi-angle spectral extreme ultraviolet reflectometry (EUVR). Layer structure parameters and optical constants of LaLuO3 are determined simultaneously by fitting angular reflectivity curves in a wide spectral range (70-200 eV). From near-edge optical constant analysis, La: Lu stoichiometry ratio and the film density are derived. Sample structure is additionally analyzed using XRR, AFM and TEM methods. EUVR as a method of structural characterization is discussed in comparison with XRR. Correlation error analysis of the layer structure parameters, obtained from independent EUVR and XRR fits, is presented.

【 授权许可】

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