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THIN SOLID FILMS 卷:541
M-line spectroscopic, spectroscopic ellipsometric and microscopic measurements of optical waveguides fabricated by MeV-energy N+ ion irradiation for telecom applications
Article; Proceedings Paper
Banyasz, I.1  Berneschi, S.2,3  Fried, M.4  Lohner, T.4  Conti, G. Nunzi3  Righini, G. C.3  Pelli, S.3  Zolnai, Z.4 
[1] Hungarian Acad Sci, Wigner Res Ctr Phys, POB 49, H-1525 Budapest, Hungary
[2] Enrico Fermi Ctr Study & Res, I-00184 Rome, Italy
[3] IFAC CNR, Nello Carrara Inst Appl Phys, MDF Lab, I-50019 Sesto Fiorentino, FI, Italy
[4] Hungarian Acad Sci, Res Ctr Nat Sci, Inst Tech Phys & Mat Sci, H-1525 Budapest, Hungary
关键词: Optical waveguide;    Ion beam irradiation;    M-line spectroscopy;    Spectroscopic ellipsometry;    Er-doped tungsten-tellurite glass;    Bismuth germanate;    Interference phase contrast microscopy;   
DOI  :  10.1016/j.tsf.2012.11.134
来源: Elsevier
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【 摘 要 】

Irradiation with N+ ions of the 1.5-3.5 MeV energy range was applied to optical waveguide formation. Planar and channel waveguides have been fabricated in an Er-doped tungsten-tellurite glass, and in both types of bismuth germanate (KO) crystals: Bi4Ge3O12 (eulytine) and Bi12GeO20 (sillenite). Multi-wavelength m-line spectroscopy and spectroscopic ellipsometry were used for the characterisation of the ion beam irradiated waveguides. Planar waveguides fabricated in the Er-doped tungsten-tellurite glass using irradiation with N+ ions at 3.5 MeV worked even at the 1550 nm telecommunication wavelength. 3.5 MeV N+ ion irradiated planar waveguides in eulytine-type BGO worked up to 1550 nm and those in sillenite-type BGO worked up to 1330 nm. (C) 2012 Elsevier B.V. All rights reserved.

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