On the film density using high power impulse magnetron sputtering

SURFACE & COATINGS TECHNOLOGY

卷:205

Article

Samuelsson, Mattias^1,2  Lundin, Daniel¹  Jensen, Jens³  Raadu, Michael A.⁴  Gudmundsson, Jon Tomas^5,6  Helmersson, Ulf¹ 

[1] Linkoping Univ, Dept Phys Chem & Biol, Plasma & Coatings Phys Div, IFM Mat Phys, SE-58183 Linkoping, Sweden

[2] Impact Coatings, SE-58216 Linkoping, Sweden

[3] Linkoping Univ, Thin Film Phys Div, IFM Mat Phys, SE-58183 Linkoping, Sweden

[4] Royal Inst Technol, Div Space & Plasma Phys, Sch Elect Engn, SE-10044 Stockholm, Sweden

[5] Univ Iceland, Inst Sci, IS-107 Reykjavik, Iceland

[6] Univ Iceland, Dept Elect & Comp Engn, IS-107 Reykjavik, Iceland

关键词: HIPIMS;    HPPMS;    DCMS;    Density;    RBS;    Global plasma model;   

DOI  :  10.1016/j.surfcoat.2010.07.041

来源: Elsevier

【 摘 要 】

The influence on thin film density using high power impulse magnetron sputtering (HIPIMS) has been investigated for eight different target materials (Al, Ti, Cr. Cu, Zr, Ag, Ta, and Pt). The density values as well as deposition rates have been compared to results obtained from thin films grown by direct current magnetron sputtering (DCMS) under the same experimental conditions. Overall, it was found that the HIPIMS deposited coatings were approximately 5-15% denser compared to the DCMS deposited coatings This could be attributed to the increased metal ion bombardment commonly seen in HIPIMS discharges, which also was verified using a global plasma model to assess the degree of ionization of sputtered metal One key feature is that the momentum transfer between the growing film and the incoming metal ions is very efficient due to the equal mass of film and bombarding species, leading to a less pronounced columnar microstructure As expected the deposition rates were found to be lower for HiPIMS compared to DCMS For several materials this decrease is not as pronounced as previously reported in the literature, which is shown in the case of Ta. Pt, and Ag with rate(HIPIMS)/rate(DCMS)-70-85%. while still achieving denser coatings (C) 2010 Elsevier B.V. All rights reserved

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