Dual-magnetron open field sputtering system for sideways deposition of thin films

SURFACE & COATINGS TECHNOLOGY

卷:204

Article

Aijaz, Asim¹ 

[1] Linkoping Univ, Dept Phys Chem & Biol, IFM Mat Phys, Plasma & Coatings Phys Div, SE-58183 Linkoping, Sweden

关键词: Dual-magnetron;    Open field configuration;    Sideways deposition;    HiPIMS;    HPPMS;    DCMS;   

DOI  :  10.1016/j.surfcoat.2009.11.044

来源: Elsevier

【 摘 要 】

A dual-magnetron system for deposition inside tubular substrates has been developed. The two magnetrons are facing each other and have opposing magnetic fields forcing electrons and thereby also ionized material to be transported radially towards the substrate. The depositions were made employing direct current magnetron sputtering (DCMS) and high power impulse magnetron sputtering (HiPIMS). To optimize the deposition rate, the system was characterized at different separation distances between the magnetrons under the same sputtering conditions. The deposition rate is found to increase with increasing separation distance independent of discharge technique. The emission spectrum from the HiPIMS plasma shows a highly ionized fraction of the sputtered material. The electron densities of the order of 10(16) m(-3) and 10(18) m(-3) have been determined in the DCMS and the HiPIMS plasma discharges respectively. The results demonstrate a successful implementation of the concept of sideways deposition of thin films providing a solution for coating complex shaped surfaces. (C) 2009 Elsevier B.V. All rights reserved

【 授权许可】

Free