Use of Cr Interlayer to Promote the Adhesion of SiC Films Deposited on Ti-6Al-4V by HiPIMS

Materials Research

Abrão Chiaranda Merij¹  Tarcila Sugahara¹  Gislene Valdete Martins¹  Argemiro Soares Da Silva Sobrinho¹  Danieli Aparecida Pereira Reis¹  Polyana Alves Radi Gonçalves¹  Marcos Massi¹ 

关键词: adhesion;    Cr interlayer;    HiPIMS;    SiC thin film;   

DOI  :  10.1590/1516-1439.313114

来源: SciELO

【 摘 要 】

AbstractIn this paper, chrome (Cr) thin films were deposited and used as interlayer between SiC films and Ti-6Al-4V substrates. Films and interlayers were obtained by using HiPIMS (High Power Impulse Magnetron Sputtering) technique. Interlayers were growth for 5, 30, and 60 minutes. The films were analyzed with respect to morphology, stoichiometry, thickness, roughness, and adhesion. The results showed that the HiPIMS technique was efficient to produce dense thin films and that the adhesion increased with Cr thickness.

【 授权许可】

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