Growth and properties of amorphous Ti-B-Si-N thin films deposited by hybrid HIPIMS/DC-magnetron co-sputtering from TiB2 and Si targets

SURFACE & COATINGS TECHNOLOGY

卷:259

Article

Fager, H.¹  Greczynski, G.¹  Jensen, J.¹  Lu, J.¹  Hultman, L.¹ 

[1] Linkoping Univ, Dept Phys Chem & Biol IFM, Thin Film Phys Div, SE-58183 Linkoping, Sweden

关键词: HIPIMS;    Transmission electron microscopy (TEM);    Amorphous;    Thin films;    TiBSiN;    Hardness;   

DOI  :  10.1016/j.surfcoat.2014.10.053

来源: Elsevier

【 摘 要 】

Amorphous nitrides are explored for their homogeneous structure and potential use as wear-resistant coatings, beyond their much studied nano- and microcrystalline counterparts. (TiB2)(1-x)SixN thin films were deposited on Si(001) substrates by a hybrid technique of high power impulse magnetron sputtering (HIPIMS) combined with dc magnetron sputtering (DCMS) using TiB2 and Si targets in a N-2/Ar atmosphere. By varying the sputtering dc power to the Si target from 200 to 2000 W while keeping the average power to the TiB2-target, operated in HIPIMS mode, constant at 4000 W, the Si content in the films increased gradually from x = 0.01 to x = 0.43. The influence of the Si content on the microstructure, phase constituents, and mechanical properties was systematically investigated. The results show that the microstructure of as-deposited (TiB2)(1-x)SixN films changes from nanocrystalline with 2-4 nm TiN grains for x = 0.01 to fully electron diffraction amorphous for x = 022. With increasing Si content, the hardness of the films increases from 8.5 GPa with x = 0.01 to 17.2 GPa with x = 0.43. (C) 2014 Elsevier B.V. All rights reserved.

【 授权许可】

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