Comparative investigation of Al- and Cr-doped TiSiCN coatings

SURFACE & COATINGS TECHNOLOGY

卷:205

Article

Shtansky, D. V.¹  Kuptsov, K. A.¹  Kiryukhantsev-Korneev, Ph V.¹  Sheveiko, A. N.¹  Fernandez, A.²  Petrzhik, M. I.¹ 

[1] Natl Univ Sci & Technol MISIS, Moscow, Russia

[2] Univ Seville, CSIC, Ctr Mixto, Inst Ciencia Mat Sevilla, Seville 41092, Spain

关键词: Al- and Cr-doped TiSiCN coatings;    Magnetron sputtering;    Structure;    Mechanical and tribological properties;    Thermal stability;    High-temperature oxidation resistance;   

DOI  :  10.1016/j.surfcoat.2011.04.012

来源: Elsevier

【 摘 要 】

The aim of this work was a comparative investigation of the structure and properties of Al- and Cr-doped TiSiCN coatings deposited by magnetron sputtering of composite TiAlSiCN and TiCrSiCN targets produced by self-propagating high-temperature synthesis method. Based on X-ray diffraction, scanning and transmission electron microscopy. X-ray photoelectron spectroscopy, and Raman spectroscopy data, the Al- and Cr-doped TiSiCN coatings possessed nanocomposite structures (Ti,Al)(C,N)/a-(Si,C) and (Ti,Cr)(C,N)/a-SiCxNy/a-C with cubic crystallites embedded in an amorphous matrix. To evaluate the thermal stability and oxidation resistance, the coatings were annealed either in vacuum at 1000, 1100, 1200, and 1300 degrees C or in air at 1000 degrees C for 1 h. The results obtained show that the hardness of the Al-doped TiSiCN coatings increased from 41 to 46 GPa, reaching maximum at 1000 degrees C, and then slightly decreased to 38 GPa at 1300 degrees C. The Cr-doped TiSiCN coatings demonstrated high thermal stability up to 1100 degrees C with hardness above 34 GPa. Although both Al-and Cr-doped TiSiCN coatings possessed improved oxidation resistance up to 1000 degrees C, the TiAlSiCN coatings were more oxidation resistant than their TiCrSiCN counterparts. The TiCrSiCN coatings showed better tribological characteristics both at 25 and 700 degrees C and superior cutting performance compared with the TiAlSiCN coatings. (C) 2011 Elsevier B.V. All rights reserved.

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