Analysis on temperature effect on the mechanical and tribological properties of titanium nitride thin films

7th International Conference on Advanced Concepts in Mechanical Engineering

Merie, V.V.^1 ; Brleanu, C.^2 ; Pustan, M.S.^2 ; Negrea, G.^1 ; Pintea, I.M.^2

Materials Science and Engineering Department, Technical University of Cluj-Napoca, Cluj-Napoca, Romania^1

Mechanical Systems Engineering Department, Technical University of Cluj-Napoca, Cluj-Napoca, Romania^2

关键词: High purity targets;    Mechanical and tribological properties;    Mechanical characteristics;    Reactive magnetron sputtering;    Silicon substrates;    Testing temperature;    Titanium nitride thin films;    Tribological characteristics;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/147/1/012019/pdf
DOI  :  10.1088/1757-899X/147/1/012019

来源: IOP

【 摘 要 】

The main goal of this paper is to study the influence of the temperature on the mechanical and tribological characteristics of titanium nitride thin films. The titanium nitride thin films were deposited by reactive magnetron sputtering on silicon substrates using a titanium high purity target. The films were deposited in different conditions. Several films were deposited on silicon substrate at room temperature while the others were obtained after the substrate was preheated. The majority of the films were deposited on non-biased substrates while the rest were deposited on substrates to which a negative bias was applied. Once the films were deposited, the characterization was realized by atomic force microscopy investigations determining the topographical parameters as well as the mechanical properties such as the modulus of elasticity and the hardness. The mechanical properties mentioned before were determined at 20 °C, 40 °C, 60 °C, 80 °C and 100 °C in order to establish the effect of testing temperature on the mechanical characteristics. The results highlighted a significant influence of temperature on the mechanical and tribological properties of the investigated titanium nitride thin films.