Dependence of Optical Emission Spectra on Argon Gas Pressure during Modulated Pulsed Power Magnetron Sputtering (MPPMS)

Plasma

Keizo Tsukamoto¹  Naoyuki Hirata¹  Hiroaki Yamamoto¹  Masahide Tona¹  Fuminori Misaizu²  Keijiro Ohshimo²  Hiroshi Nishida³  Yuki Nakagomi³  Masaomi Sanekata³  Nobuo Nishimiya³  Yoshihiro Hirai³  Kiyokazu Fuke⁴ 

[1] Ayabo Corporation, Anjo Aichi 446-0052, Japan;Department of Chemistry, Graduate School of Science, Tohoku University, Sendai 980-8578, Japan;Faculty of Engineering, Tokyo Polytechnic University, Atsugi Kanagawa 243-0297, Japan;Toyota Physical and Chemical Research Institute, Nagakute Aichi 480-1192, Japan;

关键词: magnetron sputtering;    HPPMS;    MPPMS;    DOMS;    optical emission spectroscopy;    delayed discharge;   

DOI  :  10.3390/plasma4020018

来源: DOAJ

【 摘 要 】

Modulated pulsed power magnetron sputtering (MPPMS) of titanium was investigated as a function of argon gas pressure using optical emission spectroscopy (OES). Delays in discharge and the formation of comb-like discharge current waveforms due to splitting and pulsing were observed with a decrease in pressure. This observation corresponds to the evolution from MPPMS condition to deep-oscillation-magnetron-sputtering (DOMS)-like condition by changing discharge gas pressure. The optical emission intensities of the ionic species (Ar⁺ and Ti⁺) increased as the comb-like current waveforms were formed with decreasing Ar pressure. This behavior showed a marked contrast to that of the neutral species (Ar and Ti). The Ar pressure dependence of OES was revealed to be due to the plasma build-up stage, which is the initial generation process of plasma discharge in pulsed dc magnetron sputtering, from the temporal profile for the atomic-line intensities of the optically emitting species in MPPMS and DOMS-like plasmas.

【 授权许可】

Unknown