Plasma | 卷:4 |
Delayed Discharge Bridging Two Sputtering Modes from Modulated Pulsed Power Magnetron Sputtering (MPPMS) to Deep Oscillation Magnetron Sputtering (DOMS) | |
Hiroaki Yamamoto1  Masahide Tona1  Keizo Tsukamoto1  Naoyuki Hirata1  Fuminori Misaizu2  Keijiro Ohshimo2  Tatsuya Watabe3  Hiroshi Nishida3  Yuki Nakagomi3  Masaomi Sanekata3  Nobuo Nishimiya3  Yoshihiro Hirai3  Kiyokazu Fuke4  | |
[1] Ayabo Corporation, Anjo Aichi 446-0052, Japan; | |
[2] Department of Chemistry, Graduate School of Science, Tohoku University, Sendai 980-8578, Japan; | |
[3] Faculty of Engineering, Tokyo Polytechnic University, Atsugi Kanagawa 243-0297, Japan; | |
[4] Toyota Physical and Chemical Research Institute, Nagakute Aichi 480-1192, Japan; | |
关键词: magnetron sputtering; HPPMS; MPPMS; DOMS; delayed discharge; electrical breakdown; | |
DOI : 10.3390/plasma4020016 | |
来源: DOAJ |
【 摘 要 】
Delayed discharges due to electrical breakdown are observed in modulated pulsed pow er magnetron sputtering (MPPMS) plasma of titanium. The delayed discharge, which is remarkable with decreasing argon gas pressure, transforms the discharge current waveform from a standard modulated pulsed discharge current waveform to a comb-like discharge current waveform consisting of several pulses with high power. In addition, the delay times, consisting of statistical times and formative times in the delayed MPPMS discharges, are experimentally measured with the help of Laue plot analysis. The pressure dependence of delay times observed indicates that the delayed discharge behavior matches the breakdown characteristics well. In the present study, the delayed discharge dynamics of the comb-like discharge current waveform, which can be the origin of deep oscillation magnetron sputtering, are investigated based on measurement of the delay times and the characteristics of discharge current waveforms.
【 授权许可】
Unknown