The Target Material Influence on the Current Pulse during High Power Pulsed Magnetron Sputtering

Frontiers in Physics

phanos¹  Konstantinidis, Sté²  Depla, Diederik³  Moens, Filip³ 

[1] de Mons, Belgium;Chimie des Interactions Plasma-Surface, UniversitéDepartment of Solid State Sciences, Ghent University, Belgium

关键词: HPPMS;    gas rarefaction;    electron emission;    target material;    Waveform Analysis;   

DOI  :  10.3389/fphy.2017.00051

学科分类：物理（综合）

来源: Frontiers

【 摘 要 】

The current-time characteristic during high power pulsed magnetron sputtering is measured under identical conditions for seventeen different target materials. Based on physical processes such as gas rarefaction, ion-induced electron emission, and electron impact ionization, two test parameters were derived that significantly correlate with specific features of the current-time characteristic: i) the peak current is correlated to the momentum transfer between the sputtered material and the argon gas, ii) while the observed current plateau after the peak is connected to the metal ionization rate.

【 授权许可】

CC BY