Towards Scalable Large-Area Pulsed Laser Deposition

Materials

Evgeny Zamburg¹  Alexander Mikhaylichenko²  Zakhar Vakulov³  Viktor S. Klimin⁴  Roman Tominov⁴  Oleg A. Ageev⁴  Vladimir A. Smirnov⁴  Daniil Khakhulin⁵ 

[1] Department of Electrical & Computer Engineering, National University of Singapore, 4 Engineering Drive 3, Singapore 117583, Singapore;FORS Development Center, 3, Trifonovskiy Tupik, 129272 Moscow, Russia;Federal Research Centre, Southern Scientific Centre of the Russian Academy of Sciences (SSC RAS), 41 Chekhov St., 344006 Rostov-on-Don, Russia;Institute of Nanotechnologies, Electronics and Equipment Engineering, Southern Federal University, 2 Shevchenko St., 347922 Taganrog, Russia;Research Laboratory of Functional Nanomaterials Technology, Southern Federal University, 2 Shevchenko St., 347922 Taganrog, Russia;

关键词: pulsed laser deposition;    nanomaterials;    computer simulation;    thin films;    large-area deposition;    metal oxides;   

DOI  :  10.3390/ma14174854

来源: DOAJ

【 摘 要 】

One of the significant limitations of the pulsed laser deposition method in the mass-production-technologies of micro- and nanoelectronic and molecular device electronic fabrication is the issue of ensuring deposition of films with uniform thickness on substrates with large diameter (more than 100 mm) since the area of the laser spot (1–5 mm²) on the surface of the ablated target is incommensurably smaller than the substrate area. This paper reports the methodology that allows to calculate the distribution profile of the film thickness over the surface substrate with a large diameter, taking into account the construction and technological parameters of the pulsed laser deposition equipment. Experimental verification of the proposed methodology showed that the discrepancy with the experiment does not exceed 8%. The modeling of various technological parameters influence on the thickness uniformity has been carried out. Based on the modeling results, recommendations and parameters are proposed for manufacturing uniform thickness films. The results allow for increasing the film thickness uniformity with the thickness distribution < 5% accounts for ~ 31% of 300 mm diameter substrate.

【 授权许可】

Unknown