Contrast Analysis of Polarization in Three-Beam Interference Lithography

Applied Sciences

Jing Du¹  Wei Yan¹  Simo Wang²  Fuping Peng²  Jialin Du² 

[1] Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China;University of Chinese Academy of Sciences, Beijing 100049, China;

关键词: pattern contrast;    polarization;    incident angle;    interference lithography;   

DOI  :  10.3390/app11114789

来源: DOAJ

【 摘 要 】

This paper analyzes the effect of polarization and the incident angle on the contrasts of interference patterns in three-beam interference lithography. A non-coplanar laser interference system was set up to simulate the relationship between contrast, beam polarization, and the incident angle. Different pattern periods require different incident angles, which means different contrast losses in interference lithography. Two different polarization modes were presented to study the effects of polarization with different incident angles based on theoretical analysis simulations. In the case of the co-directional component TE polarization mode, it was demonstrated that the pattern contrast decreases with the increase in the incident angle and the contrast loss caused by the polarization angle error also grew rapidly. By changing the mode to azimuthal (TE-TE-TE) polarization, the contrast of the interference pattern can be ensured to remain above 0.97 even though the incident angle is large. In addition, TE-TE-TE mode can accept larger polarization angle errors. This conclusion provides a theoretical basis for the generation of high-contrast light fields at different incident angles, and the conclusion is also applicable to multi-beam interference lithography.

【 授权许可】

Unknown