Deposition and Analysis of DLC Thin Films Obtained on 7075 Aluminum Alloy

Problemy Mechatroniki

František REHÁK¹  Mariana KUFFOVÁ²  Marián MARTON³  Daniel KOTTFER⁴ 

[1] Aleksander Dubcek University, Trencin, Slovak Republic, Faculty of Special Technology;Armed Forces Academy, Liptovsky Mikulas, Slovakia;Slovak University of Technology, Bratislava, Slovak Republic, Faculty of Electrical Engineering and Information Technology;Technical University, Kosice, Slovak Republic, Faculty of Mechanical Engineering;

关键词: a-C:H film;    CN film;    hardness;    Young’s modulus;    7075 Al alloy;   

DOI  :  10.5604/01.3001.0010.4108

来源: DOAJ

【 摘 要 】

In this study a-C:H (hydrogenated amorphous carbon) thin films were deposited on the 7075 Al alloy without and with admixture gas (N2) using a DC CVD (direct current chemical vapor deposition) method. The structural and mechanical properties were analyzed using Raman spectroscopy, SEM and nanoindentation. We obtained hardness of a-C:H thin film without and with N2 equal to 27.3 GPa and 21.4 GPa, respectively. Values of the Young’s modulus were equal to 135.5 GPa and 205.2 GPa, respectively.

【 授权许可】

Unknown