Microstructures and Mechanical Properties of TiCrZrNbNx Alloy Nitride Thin Films

Entropy

Chun-Huei Tsau¹ 

关键词: TiCrZrNbN_x;    nitride film;    microstructure;    deposition rate;    hardness;    Young’s modulus;   

DOI  :  10.3390/e15115012

来源: mdpi

【 摘 要 】

Abstract: The pure elements Ti, Zr, Cr, Nb were selected to produce an TiCrZrNb alloy target and deposited thin films thereof by a reactive high vacuum DC sputtering process. Nitrogen was used as the reactive gas to deposit the nitride thin films. The effect of nitriding on the properties of the TiCrZrNbN_x film was tested by changing the nitrogen ratio of the atmosphere. All of the as-deposited TiCrZrNbN_x nitride films exhibited an amorphous structure. The film thickness decreases by increasing the N₂ flow rate, because the Ar flow rate decreased and the target was poisoned by nitrogen. The hardness and Young’s modulus were also measured by a nano-indenter. The hardness and Young’s modulus of the TiCrZrNbN_x nitride films were all lower than those of a TiCrZrNb metallic film.

【 授权许可】

CC BY   
© 2013 by the authors; licensee MDPI, Basel, Switzerland.