| Applied Sciences | |
| In Situ X-ray Measurements to Follow the Crystallization of BaTiO3 Thin Films during RF-Magnetron Sputter Deposition | |
| Uwe Klemradt1  Christian Bonar Zeuthen2  Peter Walter3  Wiebke Ohm3  JanTorben Roeh3  Markus Ilchen3  | |
| [1] 2nd. Institute of Physics B and JARA-FIT, RWTH Aachen University, Otto-Blumenthal-Str. 1, D-52074 Aachen, Germany;Department of Chemistry, Aarhus University, Langelandsgade 140, 8000 Aarhus C, Denmark;Deutsches Elektronen-Synchrotron, Notkestr. 85, 22607 Hamburg, Germany; | |
| 关键词: GISAXS; GIXRPD; XRR; in situ; synchrotron radiation; oxid thin films; | |
| DOI : 10.3390/app11198970 | |
| 来源: DOAJ | |
【 摘 要 】
Here, we report on adding an important dimension to the fundamental understanding of the evolution of the thin film micro structure evolution. Thin films have gained broad attention in their applications for electro-optical devices, solar-cell technology, as well storage devices. Deep insights into fundamental functionalities can be realized via studying crystallization microstructure and formation processes of polycrystalline or epitaxial thin films. Besides the fundamental aspects, it is industrially important to minimize cost which intrinsically requires lower energy consumption at increasing performance which requires new approaches to thin film growth in general. Here, we present a state of the art sputtering technique that allows for time-resolved in situ studies of such thin film growth with a special focus on the crystallization via small angle scattering and X-ray diffraction. Focusing on the crystallization of the example material of BaTiO
【 授权许可】
Unknown