Study on Phonon Localization in Silicon Film by Molecular Dynamics

Coatings

Haochun Zhang¹  Wenbo Sun¹  Qi Wang¹  Jian Zhang¹  Dong Zhang¹ 

[1] School of Energy and Engineering, Harbin Institute of Technology, Harbin 150001, China;

关键词: phonon localization;    silicon;    in situ annealing;    perforation;    molecular dynamics;   

DOI  :  10.3390/coatings12040422

来源: DOAJ

【 摘 要 】

In recent years, nanoscale thermal cloaks have received extensive attention from researchers. Amorphization, perforation, and concave are commonly used methods for building nanoscale thermal cloaks. However, the comparison of the three methods and the effect of different structural proportions on phonon localization have not been found. Therefore, in this paper, an asymmetrical structure is constructed to study the influence of different structure proportions on phonon localization by amorphization, perforation, and concave silicon film. We first calculated the phonon density of states (PDOS) and the mode participation rate (MPR). To quantitatively explore its influence on phonon localization, we proposed the concept of the degree of phonon localization (DPL) and explored the influence of center and edge effects on phonon localization. We found that for different processing methods, the degree of phonon localization increased with the increase in the processing regions. Compared to the edge, the center had a stronger influence on phonon localization, and the higher the degree of disorder, the stronger the phonon localization. Our research can guide the construction of a nanoscale thermal cloak.

【 授权许可】

Unknown