Comparison of the Physicochemical Properties of TiO2 Thin Films Obtained by Magnetron Sputtering with Continuous and Pulsed Gas Flow

Coatings

Jerzy Morgiel¹  Damian Wojcieszak¹  Michał Mazur¹  Artur Wiatrowski²  Des Gibson²  Agata Obstarczyk²  Danuta Kaczmarek² 

[1] Technology, Janiszewskiego 11/17, 50-372 Wroclaw, Poland;;Faculty of Microsystem Electronics and Photonics, Wroclaw University of Science &

关键词: gas impulse magnetron sputtering;    thin films;    TiO₂;    microstructure;    surface properties;    optical properties;    mechanical properties;    hardness;    scratch resistance;   

DOI  :  10.3390/coatings8110412

来源: DOAJ

【 摘 要 】

In this paper, a comparison of TiO₂ thin films prepared by magnetron sputtering with a continuous and pulsed gas flow was presented. Structural, surface, optical, and mechanical properties of deposited titanium dioxide coatings were analyzed with the use of a wide range of measurement techniques. It was found that thin films deposited with a gas impulse had a nanocrystalline rutile structure instead of fibrous-like anatase obtained with a continuous gas flow. TiO₂ thin films deposited with both techniques were transparent in the visible wavelength range, however, a much higher refractive index and packing density were observed for coatings deposited by the pulsed gas technique. The application of a gas impulse improved the hardness and scratch resistance of the prepared TiO₂ thin films.

【 授权许可】

Unknown