Optical near-field mapping of plasmonic nanostructures prepared by nanosphere lithography

Beilstein Journal of Nanotechnology

卷:9

Alexandre Merlen¹  Gitanjali Kolhatkar²  Chahinez Dab²  Jiawei Zhang²  Andreas Ruediger²  Gregory Q. Wallace³  François Lagugné-Labarthet³ 

[1] IM2NP, UMR CNRS 7334, Aix Marseille Université et Université de Toulon, Site de l’Université de Toulon, 83957 La Garde Cedex, France;

[2] Institut National de la Recherche Scientifique - Énergie, Matériaux, Télécommunications, 1650 Boulevard Lionel-Boulet, J3X 1S2, Varennes, Québec, Canada;

[3] Western University (The University of Western Ontario), Chemistry Department and Centre for Materials and Biomaterials, 1151 Richmond Street, London, ON, N6A5B7, Canada;

关键词: apertureless scanning near-field optical microscopy;    diffuse signal;    nanosphere lithography;    photomultiplier tube;    plasmonic nanostructures;   

DOI  :  10.3762/bjnano.9.144

来源: DOAJ

【 摘 要 】

We introduce a simple, fast, efficient and non-destructive method to study the optical near-field properties of plasmonic nanotriangles prepared by nanosphere lithography. Using a rectangular Fourier filter on the blurred signal together with filtering of the lower spatial frequencies to remove the far-field contribution, the pure near-field contributions of the optical images were extracted. We performed measurements using two excitation wavelengths (532.1 nm and 632.8 nm) and two different polarizations. After the processing of the optical images, the distribution of hot spots can be correlated with the topography of the structures, as indicated by the presence of brighter spots at the apexes of the nanostructures. This technique is validated by comparison of the results to numerical simulations, where agreement is obtained, thereby confirming the near-field nature of the images. Our approach does not require any advanced equipment and we suggest that it could be applied to any type of sample, while keeping the measurement times reasonably short.

【 授权许可】

Unknown