Fabrication of sub-wavelength structures on silicon dioxide

Micro & nano letters

article

Mao-Jung Huang¹  Yu-Hsiang Tang¹  Jien-Yin Su¹  Nien-Nan Chu¹  Ming-Hua Shiao¹  Chien-Nan Hsiao¹ 

[1] Instrument Technology Research Center, National Applied Research Laboratories

关键词: antireflection coatings;    gold;    infrared spectra;    nanofabrication;    nanolithography;    nanostructured materials;    sputter etching;    visible spectra;    size 180 nm;    size 50 nm;    wavelength 400 nm to 950 nm;    time 3 min;    size 200 A;    time 30 s;    SiO2;    Au;    subwavelength structure fabrication;    silicon dioxide;    nanosphere lithography;    inductively coupled plasma reactive ion etching;    glass substrate;    broadband antireflection;    incident light transmittance;    subwavelength structure surfaces;    mean reflectance;    blank glass;    insulated window;    nanodot array structure;    fabrication technology;    visible light;    etched surface;    gold layer;    mean transmittance;   

DOI  :  10.1049/mnl.2013.0289

学科分类：计算机科学（综合）

来源: Wiley

【 摘 要 】

Background: The aim of this study was to evaluate the hepatic protective effects of dexmedetomidine in a rat model of renal ischemia-reperfusion injury  Methodology: Rats were randomly divided into 3 equal groups (n = 6); control (C) group, ischemia / reperfusion (I/R) group, (D + I/R) group which dexmedetomidine was given and I/R was administered.

【 授权许可】

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