Role of mask patterns in fabrication of Si nanotip arrays

Micro & nano letters

article

Si-Hyeong Cho¹  Jung-Hwan Lee¹  Jin-Goo Park¹ 

[1] Department of Bionano Technology, Hanyang University;Department of Materials Engineering, Hanyang University

关键词: atomic force microscopy;    elemental semiconductors;    masks;    nanofabrication;    nanostructured materials;    semiconductor growth;    silicon;    sputter etching;    surface roughness;    Si;    size 450 nm to 750 nm;    size 20 nm to 80 nm;    AFM;    atomic force microscopy measurement;    Si nanotip structures;    tip height;    tip size;    parallel pattern;    etch rate;    hexagonal array;    honeycomb mask pattern;    wavy array;    alternate square array pattern;    circular mask pattern;    square mask pattern;    conical shaped Si nanotip;    pyramidal shaped Si nanotip;    initial mask patterns;    quantitative etch characteristics;    surface roughness;    surface profile;    reactive ion etching;    silicon nanotip array shapes;    Si nanotip array fabrication;   

DOI  :  10.1049/mnl.2012.0834

学科分类：计算机科学（综合）

来源: Wiley

【 摘 要 】

Different shapes of silicon (Si) nanotip arrays using reactive ion etching with various mask patterns were fabricated, and the surface profile, surface roughness and quantitative etch characteristics of the Si nanotip were characterised. It was found that the geometry as well as etch characteristics of Si nanotip arrays could be modified by changing the initial mask patterns. Pyramidal and conical shaped Si nanotips could be obtained from square and circular mask patterns, respectively. The alternate square array pattern resulted in a Si nanotip with a wavy array whereas the honeycomb mask pattern resulted in a Si nanotip in a hexagonal array. In terms of etch rate, the circular pattern mask showed faster etching than the square patterns. Also, the parallel pattern showed faster etching than the alternate pattern under the same conditions. The tip size and height of Si nanotip structures determined by atomic force microscopy measurement were in the range of 50–80 and 450–750 nm, respectively.

【 授权许可】

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