Simple process for 60 nm patterned nickel stamp replication

Micro & nano letters

article

Ran Zhang¹  Jinkui Chu¹  Jian Min¹  Haixiang Wang¹  Zhiwen Wang¹ 

[1] The Key Laboratory for Micro/Nano Technology and System of Liaoning Province, Dalian University of Technology

关键词: electroforming;    embossing;    mechanical strength;    nanofabrication;    nanopatterning;    nanostructured materials;    nickel;    replica techniques;    sputtering;    patterned nickel stamp replication;    nickel nanoimprint stamp replication;    nanograting structures;    master silicon stamp;    polymer substrate;    hot embossing process;    nickel layer;    sputtering;    substrate surface;    seed layer;    electroforming process;    replica back plane;    master stamp dimensions;    performance test;    replicated stamp;    replica mechanical strength;    size 60 nm;    Ni;   

DOI  :  10.1049/mnl.2012.0841

学科分类：计算机科学（综合）

来源: Wiley

【 摘 要 】

In our everyday teaching we experience that many first-year students are ill prepared for the demands of an academic study process in technical domains. Usually, the students’ problems are not rooted in a lack of intellectual capacity or previously acquired founding expertise in the chosen course of study. Rather, it is the deficiencies in more basic competencies such as practical and cognitive, self and social areas that place a major hurdle in the students’ learning process. In an attempt to elucidate and improve this situation, as a first step we develop a questionnaire that captures the high school teachers’ as well as the lecturers’ expectations on student competencies in these areas, as opposed to their perception of competencies that first-year students possess in reality. This questionnaire is also applied to capture the university-employer skill gap.

【 授权许可】

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