Investigation of room temperature deposited silicon dioxide thin films for surface texturisation of monocrystalline {100} silicon

Micro & nano letters

article

Akarapu Ashok¹  Prem Pal¹ 

[1] Department of Physics, MEMS and Micro/Nano Systems Laboratory, Indian Institute of Technology Hyderabad

关键词: silicon compounds;    thin films;    surface texture;    anodisation;    etching;    electrolytes;    refractive index;    scanning electron microscopy;    surface morphology;    silicon dioxide thin film deposition;    surface texturisation;    monocrystalline {100} silicon;    crystalline silicon-based solar cell fabrication;    wet anisotropic etchant;    randomly oriented upright pyramids;    silicon dioxide thin film synthesis;    anodic oxidation technique;    KOH solutions;    {100} surface;    lithography;    oxide film thickness;    electrolyte;    potentiodynamic regime;    refractive index;    spectroscopic ellipsometry;    scanning electron microscopy;    etched surface morphology;    KOH concentration;    inverted pyramids;    anodic silicon dioxide;    temperature 293 K to 298 K;    Si;    SiO2;   

DOI  :  10.1049/mnl.2015.0333

学科分类：计算机科学（综合）

来源: Wiley

【 摘 要 】

Background: Intraoperative neurophysiologic monitoring helps to prevent neurologic morbidity from surgical manipulations. Anesthetic agents have a dose dependent adverse effect on the ability to record evoked potential responses. Evoked potentials are highly sensitive to fluctuations in physiological parameters. The main objective of the study was to compare midazolam and dexmedetomidine in producing minimum effect on motor evoked potential amplitude keeping consistent depth of anesthesia and to evaluate hemodynamic stability during the surgery.

【 授权许可】

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