Innovative SU-8 Lithography Techniques and Their Applications

Micromachines

Jeong Bong Lee²  Kyung-Hak Choi¹  Koangki Yoo³ 

[1] Siliconfile Technologies, Inc., Seongnam-si, Gyeonggi-do 463-050, Korea; E-Mail:;Department of Electrical Engineering, University of Texas, Dallas, Richardson, TX 75080, USA;Department of Information and Communication Engineering, Hanbat National University, Daejeon 305-719, Korea; E-Mail:

关键词: SU-8;    lithography;    backside;    inclined;    holographic interference;   

DOI  :  10.3390/mi6010001

来源: mdpi

【 摘 要 】

SU-8 has been widely used in a variety of applications for creating structures in micro-scale as well as sub-micron scales for more than 15 years. One of the most common structures made of SU-8 is tall (up to millimeters) high-aspect-ratio (up to 100:1) 3D microstructure, which is far better than that made of any other photoresists. There has been a great deal of efforts in developing innovative unconventional lithography techniques to fully utilize the thick high aspect ratio nature of the SU-8 photoresist. Those unconventional lithography techniques include inclined ultraviolet (UV) exposure, back-side UV exposure, drawing lithography, and moving-mask UV lithography. In addition, since SU-8 is a negative-tone photoresist, it has been a popular choice of material for multiple-photon interference lithography for the periodic structure in scales down to deep sub-microns such as photonic crystals. These innovative lithography techniques for SU-8 have led to a lot of unprecedented capabilities for creating unique micro- and nano-structures. This paper reviews such innovative lithography techniques developed in the past 15 years or so.

【 授权许可】

CC BY   
© 2014 by the authors; licensee MDPI, Basel, Switzerland.