Simple Response Surface Methodology: Investigation on Advance Photocatalytic Oxidation of 4-Chlorophenoxyacetic Acid Using UV-Active ZnO Photocatalyst

Materials

Kian Mun Lee²  Sharifah Bee Abd Hamid¹ 

[1] Nanotechnology & Catalysis Research Center (NANOCAT), Institute of Postgraduate Studies, University of Malaya, 50603 Kuala Lumpur, Malaysia; E-Mail

关键词: zinc oxide;    central composite design;    response surface methodology;    4-chlorophenoxyacetic acid;    photocatalytic degradation;   

DOI  :  10.3390/ma8010339

来源: mdpi

【 摘 要 】

The performance of advance photocatalytic degradation of 4-chlorophenoxyacetic acid (4-CPA) strongly depends on photocatalyst dosage, initial concentration and initial pH. In the present study, a simple response surface methodology (RSM) was applied to investigate the interaction between these three independent factors. Thus, the photocatalytic degradation of 4-CPA in aqueous medium assisted by ultraviolet-active ZnO photocatalyst was systematically investigated. This study aims to determine the optimum processing parameters to maximize 4-CPA degradation. Based on the results obtained, it was found that a maximum of 91% of 4-CPA was successfully degraded under optimal conditions (0.02 g ZnO dosage, 20.00 mg/L of 4-CPA and pH 7.71). All the experimental data showed good agreement with the predicted results obtained from statistical analysis.

【 授权许可】

CC BY   
© 2015 by the authors; licensee MDPI, Basel, Switzerland.