Cell Adhesion and in Vivo Osseointegration of Sandblasted/Acid Etched/Anodized Dental Implants

International Journal of Molecular Sciences

Mu-Hyon Kim¹  Kyeongsoon Park⁴  Kyung-Hee Choi²  Soo-Hong Kim²  Se Eun Kim³  Chang-Mo Jeong¹  Jung-Bo Huh¹ 

[1] Department of Prosthodontics, Dental Research Institute, Biomedical Research Institute, School of Dentistry, Pusan National University, Yangsan 676-870, Korea; E-Mails:;Research Development Institute, Cowellmedi Co., Ltd., Busan 617-801, Korea; E-Mails:;Department of Veterinary Surgery, College of Veterinary Medicine, Chonnam National University, Gwangju 500-757, Korea; E-Mail:;Division of Bioimaging, Chuncheon Center, Korea Basic Science Institute, Gangwon-do 200-701, Korea; E-Mail:

关键词: titanium implant;    sandblasting and acid etching;    anodization;    osteoblast;    osseointegration;   

DOI  :  10.3390/ijms160510324

来源: mdpi

【 摘 要 】

The authors describe a new type of titanium (Ti) implant as a Modi-anodized (ANO) Ti implant, the surface of which was treated by sandblasting, acid etching (SLA), and anodized techniques. The aim of the present study was to evaluate the adhesion of MG-63 cells to Modi-ANO surface treated Ti in vitro and to investigate its osseointegration characteristics in vivo. Four different types of Ti implants were examined, that is, machined Ti (control), SLA, anodized, and Modi-ANO Ti. In the cell adhesion study, Modi-ANO Ti showed higher initial MG-63 cell adhesion and induced greater filopodia growth than other groups. In vivo study in a beagle model revealed the bone-to-implant contact (BIC) of Modi-ANO Ti (74.20% ± 10.89%) was much greater than those of machined (33.58% ± 8.63%), SLA (58.47% ± 12.89), or ANO Ti (59.62% ± 18.30%). In conclusion, this study demonstrates that Modi-ANO Ti implants produced by sandblasting, acid etching, and anodizing improve cell adhesion and bone ongrowth as compared with machined, SLA, or ANO Ti implants. These findings suggest that the application of Modi-ANO surface treatment could improve the osseointegration of dental implant.

【 授权许可】

CC BY   
© 2015 by the authors; licensee MDPI, Basel, Switzerland.