Plasma Processes : Sheath and plasma parameters in a magnetized plasma system

Pramana

J Chutia¹  A Sharma¹  Bornali Singha1¹ 

[1] Institute of Advanced Study in Science and Technology, Khanapara, Guwahati 781 022, India$$

关键词: Magnetic field;    sheath;    mesh grid;    electron temperature.;   

DOI  :  

学科分类：物理（综合）

来源: Indian Academy of Sciences

【 摘 要 】

The variation of electron temperature and plasma density in a magnetized 𝑁2 plasma is studied experimentally in presence of a grid placed at the middle of the system. Plasma leaks through the negatively biased grid from the source region into the diffused region. It is observed that the electron temperature increases with the magnetic field in the diffused region whereas it decreases in the source region of the system for a constant grid biasing voltage. Also, investigation is done to see the change of electron temperature with grid biasing voltage for a constant magnetic field. This is accompanied by the study of the variation of sheath structure across the grid for different magnetic field and grid biasing voltage as well. It reveals that with increasing magnetic field and negative grid biasing voltage, the sheath thickness expands.

【 授权许可】

Unknown