X-ray reflectivity study of bias graded diamond like carbon film synthesized by ECR plasma

Bulletin of materials science

S B Singh¹  R M Dey³  N Chand¹  D S Patil¹  S K Kulkarni⁴  S K Deshpande² 

[1] Laser and Plasma Technology Division, Bhabha Atomic Research Centre, Mumbai 400 085, India$$Laser and Plasma Technology Division, Bhabha Atomic Research Centre, Mumbai 400 085, IndiaLaser and Plasma Technology Division, Bhabha Atomic Research Centre, Mumbai 400 085, India$$;UGC-DAE Consortium for Scientific Research, Bhabha Atomic Research Centre, Mumbai 400 085, India$$UGC-DAE Consortium for Scientific Research, Bhabha Atomic Research Centre, Mumbai 400 085, IndiaUGC-DAE Consortium for Scientific Research, Bhabha Atomic Research Centre, Mumbai 400 085, India$$;DST Unit on Nanoscience, Department of Physics, University of Pune, Pune 411 007, India$$CTSR, Department of Materials Science and Engineering, SUNY Stony Brook, Stony Brook, NY 11794, USA$$DST Unit on Nanoscience, Department of Physics, University of Pune, Pune 411 007, IndiaDST Unit on Nanoscience, Department of Physics, University of Pune, Pune 411 007, India$$CTSR, Department of Materials Science and Engineering, SUNY Stony Brook, Stony Brook, NY 11794, USA$$CTSR, Department of Materials Science and Engineering, SUNY Stony Brook, Stony Brook, NY 11794, USADST Unit on Nanoscience, Department of Physics, University of Pune, Pune 411 007, India$$CTSR, Department of Materials Science and Engineering, SUNY Stony Brook, Stony Brook, NY 11794, USA$$;DST Unit on Nanoscience, Department of Physics, University of Pune, Pune 411 007, India$$DST Unit on Nanoscience, Department of Physics, University of Pune, Pune 411 007, IndiaDST Unit on Nanoscience, Department of Physics, University of Pune, Pune 411 007, India$$

关键词: Diamond like carbon;    electron cyclotron resonance;    X-ray reflectivity;    roughness;    sub-plantation model;    amorphous material.;   

DOI  :  

学科分类：材料工程

来源: Indian Academy of Sciences

【 摘 要 】

Diamond like carbon (DLC) coatings were deposited on silicon substrates by microwave electron cyclotron resonance (ECR) plasma CVD process using plasma of Ar and CH4 gases under the influence of negative d.c. self bias generated on the substrates by application of RF (13.56 MHz) power. The negative bias voltage was varied from �?60 V to �?150 V during deposition of DLC films on Si substrate. Detailed X-ray reflectivity (XRR) study was carried out to find out film properties like surface roughness, thickness and density of the films as a function of variation of negative bias voltage. The study shows that the DLC films constituted of composite layer i.e. the upper sub surface layer followed by denser bottom layer representing the bulk of the film. The upper layer is relatively thinner as compared to the bottom layer. The XRR study was an attempt to substantiate the sub-plantation model for DLC film growth.

【 授权许可】

Unknown