期刊论文详细信息
SURFACE & COATINGS TECHNOLOGY 卷:131
Two-dimensional simulation of an electron cyclotron resonance plasma source with self-consistent power deposition
Article; Proceedings Paper
Liu, MH ; Hu, XW ; Wu, HM ; Wu, QC ; Yu, GY ; Pan, Y
关键词: electron cyclotron resonance;    microwave;    plasma;    density;    ionization;   
DOI  :  10.1016/S0257-8972(00)00798-2
来源: Elsevier
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【 摘 要 】

Using a refined two-dimensional hybrid-model with self-consistent microwave absorption, we have investigated the change of plasma parameters such as plasma density and ionization rate with the operating conditions. The dependence of the ion current density and ion energy and angle distribution function at the substrate surface vs. the radial position, pressure and microwave power were discussed. Results of our simulation can be compared qualitatively with many experimental measurements. (C) 2000 Published by Elsevier Science B.V. All rights reserved.

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