Resistivity-based modeling of substrate non-uniformity for low-resistivity substrate

IEICE Electronics Express

Yasuhiro Ogasahara²  Toshiharu Chiba³  Hisato Inaba³  Toshiki Kanamoto¹ 

[1] Renesas Electronics Corp.;AIST;Renesas Design Corp.

关键词: substrate noise;    substrate extraction;    low-resistivity substrate;   

DOI  :  10.1587/elex.11.20130813

学科分类：电子、光学、磁材料

来源: Denshi Jouhou Tsuushin Gakkai

【 摘 要 】

References(13)This paper suggests the modeling methods of non-uniform substrate resistivity for substrate resistance extraction. Conventional substrate model of uniform resistivity for each substrate layer can cause about 40-80% resistance extraction errors. Though model of simulated doping profile theoretically provides fine accuracy, the doping profile cannot be corrected with measurement results. The stepwise and interpolation models which this paper suggests enable 10% precision of resistance extraction and correction with measured resistance values. We also reveal that the modeling of the surface diffusion also gives large impact for resistance extraction of substrate and well.

【 授权许可】

Unknown