RTN and Annealing Related to Stress and Temperature in FIND RRAM Array

Nanoscale Research Letters

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[1] 0000 0004 0532 0580, grid.38348.34, Institute of Electronics Engineering, National Tsing Hua University, Hsinchu, Taiwan;

关键词: Random telegraph noise;    Advanced FinFET technology;    RRAM;    Anneal;   

DOI  :  10.1186/s11671-018-2846-1

来源: publisher

【 摘 要 】

In this work, an observation on random telegraph noise (RTN) signal in the read current of a FinFET dielectric RRAM (FIND RRAM) device is presented. The RTN signal of a FIND RRAM cell is found to change after the device being subjected to cycling stress. After undergoing cycling stress, RRAM cells have a stronger tendency to show more frequent and intense RTN signals. The increase of noise levels in FIND RRAM cells can be alleviated generally by high temperature anneal, and with this concept, an on chip annealing scheme is proposed and demonstrated.

【 授权许可】

CC BY