| IEICE Electronics Express | |
| Area-efficient charge pump with local boost technique for embedded flash memory | |
| Xiaoyun Li1  Weiran Kong1  Jun Xiao1  Shichang Zou1  Yiran Xu2  Guangjun Yang2  Wenyi Zhu3  Jian Hu3  | |
| [1] Shanghai Huahong Grace Semiconductor Manufacturing Corporation;State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences;University of Chinese Academy of Sciences | |
| 关键词: area-efficient; charge pump; embedded flash memory; local boost; voltage doubler; | |
| DOI : 10.1587/elex.14.20170944 | |
| 学科分类:电子、光学、磁材料 | |
| 来源: Denshi Jouhou Tsuushin Gakkai | |
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【 摘 要 】
An area-efficient charge pump (AE-CP) used for embedded flash memory is proposed with the combination of an area-efficient voltage doubler (AE-VD). An optimized strategy for AE-CP with local boost technique is discussed to maximize output capability by using low-voltage MOS capacitors together. The proposed circuits are simulated in a 130 nm CMOS process. Simulation results show the proposed AE-VD decreases the power consumption by 11.4%. And the proposed AE-CP with proposed voltage doubler achieves 29% improvement of the maximum output capability as compared to the conventional CP. A 253 à 8 KB embedded flash memory IP has been fabricated in HHGrace 130 nm 4 poly 4 metal CMOS process. The die size of the proposed IP is 0.65 mm2 and the area size of charge pump has been reduced to 0.0317 mm2 with an optimized α = 0.6 and the area ratio decreases by 10%.
【 授权许可】
CC BY
【 预 览 】
| Files | Size | Format | View |
|---|---|---|---|
| RO201902198220880ZK.pdf | 2476KB |
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