Single-Step CMOS Compatible Fabrication of High Aspect Ratio Microchannels Embedded in Silicon

Proceedings

Kluba, Marta¹ 

关键词: embedded microchannel;    HAR;    mesh mask;    single-step DRIE (Bosch process);   

DOI  :  10.3390/proceedings1040291

学科分类：社会科学、人文和艺术（综合）

来源: mdpi

【 摘 要 】

This paper presents a new method for the CMOS compatible fabrication of microchannels integrated into a silicon substrate. In a single-step DRIE process (Deep Reactive Ion Etching) a network of microchannels with High Aspect Ratio (HAR) up to 10, can be etched in a silicon substrate through a mesh mask. In the same single etching step, multidimensional microchannels with various dimensions (width, length, and depth) can be obtained by tuning the process and design parameters. These fully embedded structures enable further wafer processing and integration of electronic components like sensors and actuators in wafers with microchannels.

【 授权许可】

CC BY