期刊论文详细信息
| Active and Passive Electronic Components | |
| Titanium Silicide Formation in Presence of Oxygen | |
| G. Queirolo2 G. De Santi2 M. Costato1 G. Ottaviani1 F. Nava1 C. Nobili1 | |
| [1] Dipartimento di Fisica Universita' di Modena, via Campi 213/a, Modena 1-41100, Italy, unimore.it;SGS, via Olivetti 2, 1-20041 Agrate Brianza, Milano, Italy, sgs.com | |
| 关键词: X-Ray Diffraction; Auger Spectroscopy; Rutherford Backscattering Spectrometry; Resistivity vs. Temperature; rf Sputtering; Titanium Silicide; | |
| Others : 1367496 DOI : 10.1155/1992/94394 |
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| received in 1990-12-24, accepted in 1991-11-18, 发布年份 1991 | |
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【 授权许可】
CC BY
Copyright © 1992 Hindawi Publishing Corporation 1992
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| 094394.pdf | 1672KB |  download |
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