Informatics support of thin film deposition with specified structure development

25th International Conference on Vacuum Technique and Technology

Panfilov, Y.V.^1

Department of MSTU, Moscow

105005, Russia^1

关键词: Crystalline structure;    Deposition regimes;    Research and development;    Structure development;    Substrate temperature;    Thin film resistors;    Thin-film depositions;    Virtual experiments;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/387/1/012057/pdf
DOI  :  10.1088/1757-899X/387/1/012057

来源: IOP

【 摘 要 】

Virtual experiment method which consists of acquisition, systematization, and analysis of large experimental results of thin film deposition technology is described. The data base examples and thin film deposition of any materials result analysis are adduced. Dependence of thin films structure from thin film deposition rate and method and substrate temperature is shown. DLC thin films with amorphous and crystalline structures deposition regimes are represented. WSi thin films for using as thin film resistor in microcircuit and as a superconductor coating in one photon detectors are described. It is shown that the elaborated method of informatics support of research and development in the field of thin film deposition technology dives opportunity to analysis and choose of thin film deposition method and regimes for manufacturing of thin films with specified structure and characteristics.