Profiling of nanostructures by scratching probe nanolithography and plasma chemical etching

Scanning Probe Microscopy 2017

Tominov, R.V.^1 ; Bespoludin, V.V.^1 ; Klimin, V.S.^1 ; Smirnov, V.A.^1 ; Ageev, O.A.^1

Southern Federal University, Institute of Nanotechnologies, Electronics and Equipment Engineering, Research and Education Center Nanotechnologies, Taganrog, Russia^1

关键词: Chemical etching;    Experimental investigations;    Silicon surfaces;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/256/1/012023/pdf
DOI  :  10.1088/1757-899X/256/1/012023

来源: IOP

【 摘 要 】

This work presents the results of the experimental investigations of nanostructure profiling using scratching probe nanolithography and plasma chemical etching. It is shown, that combination of these methods allows us to profile the silicon surface with height from approximately 7,8 to 38 nm and diameter from 670 to 123 nm.