EMI shielding using composite materials with two sources magnetron sputtering

8th National Scientific Conference Advances in Electrotechnology (Postepy w Elektrotechnologii)

无线电电子学

Ziaja, J.^1 ; Jaroszewski, M.^1 ; Lewandowski, M.^1

Department of Electrical Engineering Fundamentals, Wroclaw University of Technology, Poland^1

关键词: Argon atmospheres;    Group frequency;    Metallic layers;    Sputtering power;    Sputtering process;    Sputtering time;    Supply conditions;    Switch-mode power supplies;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/113/1/012010/pdf
DOI  :  10.1088/1757-899X/113/1/012010

来源: IOP

【 摘 要 】

In this study, the preparation composite materials for electromagnetic shields using two sources magnetron sputtering DC-M is presented. A composite material was prepared by coating a nonwoven polypropylene metallic layer in sputtering process of targets Ti (purity 99%) and brass alloy MO58(58%Cu, 40%Zn, 2%Pb) and φ diameter targets = 50 mm, under argon atmosphere. The system with magnetron sputtering sources was powered using switch-mode power supply DPS (Dora Power System) with a maximum power of 16 kW and a maximum voltage of 1.2 kV with group frequency from 50 Hz to 5 kHz. The influence of sputtering time of individual targets on the value of the EM field attenuation SE [dB] was investigated for the following supply conditions: pressure pp= 2x10-3Torr, sputtering power P = 750 W, the time of applying a layer t = 5 min, group frequency fg= 2 kHz, the frequency of switching between targets fp= 1 Hz.