Atomic layer deposition of ZnO:Al on PAA substrates

INERA Conference: Vapor Phase Technologies for Metal Oxide and Carbon Nanostructures

物理学;材料科学

Blagoev, B.S.^1 ; Vlakhov, E.^1 ; Videkov, V.^2 ; Tzaneva, B.^2 ; Luka, G.^3 ; Witkowski, B.S.^3 ; Terziyska, P.^1 ; Leclercq, J.^1 ; Krajewski, T.A.^3 ; Guziewicz, E.^3 ; Dimitrov, D.Z.^1,4 ; Mehandzhiev, V.B.^1 ; Sveshtarov, P.^1

Institute of Solid State Physics, Bulgarian Academy of Sciences, 72 Tzarigradsko Chaussee Blvd, Sofia

1784, Bulgaria^1

Technical University - Sofia, 8 Kl. Ohridski Blvd, Sofia

1000, Bulgaria^2

Institute of Physics, Polish Academy of Sciences, Al. Lotnikow 32/46, Warsaw

02-668, Poland^3

Institute of Optical Materials and Technologies, Bulgarian Academy of Sciences, Acad. G. Bonchev Str., bl.109, Sofia

1113, Bulgaria^4

关键词: Different thickness;    Porous anodic alumina;    Si (100) substrate;    ZnO:Al;    ZnO:Al films;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/764/1/012004/pdf
DOI  :  10.1088/1742-6596/764/1/012004

学科分类：材料科学（综合）

来源: IOP

【 摘 要 】

In this work the ZnO:Al films of different thickness are grown on the Porous Anodic Alumina (PAA) and p-Si (100) substrates by Atomic Layer Deposition. The ZnO:Al films thicknesses are chosen appropriately in order to obtain complete filled pores as well as pores with a thin covering on the surface. The obtained structures are investigated with spectroscopic ellipsometry and Scanning Electron Microscopy (SEM) techniques.