E-beam lithography exposure conditions for the fabrication of RGB filter based on metal/dielectric subwavelength grating

3rd International School and Conference on Optoelectronics, Photonics, Engineering and Nanostructures (Saint Petersburg OPEN 2016)

Fomchenkov, S.A.^1,2 ; Butt, M.A.^1 ; Podlipnov, V.V.^1,2 ; Poletaev, S.D.^1,2 ; Skidanov, R.V.^1,2 ; Kazanskiy, N.L.^1,2

Samara State Aerospace University, Moskovskoye Shosse 34, Samara

443086, Russia^1

Image Processing Systems Institute, Russian Academy of Sciences, Molodogvardeyshaya 151, Samara

443001, Russia^2

关键词: Dielectric thin films;    e-Beam lithography;    Electric flux density;    Exposure conditions;    High transmission;    Metal grating;    Optimized parameter;    Sub-wave length grating;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/741/1/012150/pdf
DOI  :  10.1088/1742-6596/741/1/012150

来源: IOP

【 摘 要 】

The main idea of this work was to determine the optimized parameters of E-beam lithography to obtain metal grating over dielectric thin film. This combination of metal/dielectric can provide high transmission spectrum of RGB colors. Different electric flux densities were used during E-beam writing and the best resolution and symmetric periodicity was obtained at 53 μC/cm2dose.