Obtaining Au thin films in atmosphere of reactive nitrogen through magnetron sputtering

3rd International Meeting for Researchers in Materials and Plasma Technology; 1st Symposium on Nanoscience and Nanotechnology

物理学;材料科学

Quintero, J.H.^1 ; Ospina, R.^2 ; Mello, A.^2

Universidad de Medellín, Medellín, Colombia^1

Centro Brasileiro de Pesquisas Físicas (CBPF), Rio de Janeiro, Brazil^2

关键词: Au thin films;    Crystallographic textures;    High temperature;    Magnetron sputtering systems;    Nitrogen atmospheres;    Reactive nitrogen;    Substrate temperature;    Vapour deposition;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/687/1/012006/pdf
DOI  :  10.1088/1742-6596/687/1/012006

学科分类：材料科学（综合）

来源: IOP

【 摘 要 】

4d and 5d series of the transition metals are used to the obtaining nitrides metallic, due to the synthesis of PtN, AgN and AuN in the last years. Different nitrides are obtained in the Plasma Assisted Physics Vapour Deposition system, due to its ionization energy which is necessary for their formation. In this paper a Magnetron Sputtering system was used to obtain Au thin films on Si wafers in Nitrogen atmosphere. The substrate temperature was varied between 500 to 950°C. The samples obtained at high temperatures (>500°C) show Au, Si and N elements, as it is corroborated in the narrow spectrum obtained for X-Ray Photoelectron Spectroscopy; besides the competition of orientation crystallographic texture between (111) and (311) directions was present in the X-Ray Diffraction analysis to the sample heated at 950°C.