6th International Conference on Optical, Optoelectronic and Photonic Materials and Applications 2014 | |
Investigation of isochronal annealing on the optical properties of HWCVD amorphous silicon nitride deposited at low temperatures and low gas flow rates | |
Muller, T.F.G.^1 ; Jacobs, S.^1 ; Cummings, F.R.^1 ; Oliphant, C.J.^2 ; Malgas, G.F.^1 ; Arendse, C.J.^1 | |
Department of Physics, University of the Western Cape, Private Bag X17, Bellville | |
7535, South Africa^1 | |
National Metrology Institute of South Africa, Private Bag X34, Lynwood Ridge, Pretoria | |
0040, South Africa^2 | |
关键词: Bruggeman effective medium approximation; Chemical vapour deposition; Deposition regimes; Filament temperature; Isochronal annealing; Low gas flow rates; Reflection spectra; Structural complexity; | |
Others : https://iopscience.iop.org/article/10.1088/1742-6596/619/1/012014/pdf DOI : 10.1088/1742-6596/619/1/012014 |
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来源: IOP | |
【 摘 要 】
Hydrogenated amorphous silicon nitride (a-SiNx:H) is used as anti-reflection coatings in commercial solar cells. A final firing step in the production of micro-crystalline silicon solar cells allows hydrogen effusion from the a-SiNx:H into the solar cell, and contributes to bulk passivation of the grain boundaries. In this study a-SiNx:H deposited in a hot-wire chemical vapour deposition (HWCVD) chamber with reduced gas flow rates and filament temperature compared to traditional deposition regimes, were annealed isochronally. The UV-visible reflection spectra of the annealed material were subjected to the Bruggeman Effective Medium Approximation (BEMA) treatment, in which a theoretical amorphous semiconductor was combined with particle inclusions due to the structural complexities of the material. The extraction of the optical functions and ensuing Wemple-DeDomenici analysis of the wavelength-dependent refractive index allowed for the correlation of the macroscopic optical properties with the changes in the local atomic bonding configuration, involving silicon, nitrogen and hydrogen.
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Investigation of isochronal annealing on the optical properties of HWCVD amorphous silicon nitride deposited at low temperatures and low gas flow rates | 1019KB | download |