15th Latin American Workshop on Plasma Physics; 21st IAEA TM on Research Using Small Fusion Devices | |
Effect of Ion Irradiation on the Structural Properties and Hardness of a-C:H:Si:O:F Films | |
Rangel, Elidiane C.^1 ; Da Cruz, Nilson C.^1 ; Rangel, Rita C. C.^1 ; Landers, Richard^2 ; Durrant, Steven F.^1 | |
Laboratório de Plasmas Tecnológicos, Universidade Estadual Paulista, UNESP, Av. Três de Março, 511, Sorocaba, SP | |
18087-180, Brazil^1 | |
Grupo de Física de Superfícies, Departamento de Fisica Aplicada, Instituto de Fisica Gleb Wataghin, Universidade Estadual de Campinas UNICAMP, Campinas, SP | |
13083-970, Brazil^2 | |
关键词: Conventional polymers; Friction coefficients; Hexamethyl disiloxane; Hydrophobic film; Low friction coefficients; Plasma enhanced chemical vapor depositions (PE CVD); Plasma immersion ion implantation and deposition; Surface contact angle; | |
Others : https://iopscience.iop.org/article/10.1088/1742-6596/591/1/012044/pdf DOI : 10.1088/1742-6596/591/1/012044 |
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来源: IOP | |
【 摘 要 】
Amorphous carbon-based thin films, a-C:H:Si:O:F, were obtained by plasma immersion ion implantation and deposition (PIIID) from mixtures of hexamethyldisiloxane, sulfur hexafluoride and argon. For PIIID the sample holder was biased with negative 25 kV pulses at 60 Hz. The main system parameter was the proportion of SF6in the reactor feed, RSF. To allow comparison to growth without intentional ion implantation, some films were also grown by plasma enhanced chemical vapor deposition (PECVD). The objectives were to investigate the effects of fluorine incorporation and ion implantation on the film's chemical structure, and principally on the surface contact angle, hardness and friction coefficient. Infrared and X-ray photo-electron spectroscopic analyses revealed that the films are essentially amorphous and polymer-like, and that fluorine is incorporated for any non-zero value of RSF. Choice of RSFinfluences film composition and structure but ion implantation also plays a role. Depending on RSF, hydrophilic or hydrophobic films may be produced. Ion implantation is beneficial while fluorine incorporation is detrimental to hardness. For ion implanted films the friction coefficient falls about one third as RSFis increased from 0 to 60%. Films prepared by PIIID without fluorine incorporation present fairly low friction coefficients and hardnesses greater than those of conventional polymers.
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Effect of Ion Irradiation on the Structural Properties and Hardness of a-C:H:Si:O:F Films | 1598KB | download |