Nanohole formation in TEOS-HMDSO hybrid CVD films elucidated by positron beams

13th International Workshop on Slow Positron Beam Techniques and Applications

Ito, K.^1 ; Oshima, N.^1 ; Yabuuchi, A.^1 ; O'Rourke, B.E.^1

National Institute of Advanced Industrial Science and Technology (AIST), Ibaraki 305-8565, Tsukuba, Japan^1

关键词: Annealed films;    Hexamethyl disiloxane;    Hybrid thin film;    ortho-Positronium lifetime;    Positron beams;    Positron lifetime technique;    Precursor composition;    Tetra-ethyl-ortho-silicate;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/505/1/012022/pdf
DOI  :  10.1088/1742-6596/505/1/012022

来源: IOP

【 摘 要 】

Silicon-oxide-backboned hybrid thin films with thicknesses around 600 nm were fabricated through plasma enhanced chemical vapor deposition from tetraethyl orthosilicate mixed with hexamethyldisiloxane as precursors, and their subnano-scaled holes, generated by annealing at 560 °C, were investigated by means of the positron lifetime technique with a pulsed, low-energy positron beam. The hole dimension was quantified from the ortho-positronium lifetime for the as-prepared and annealed films with different compositions. The effect of the heat treatment and the precursor composition on the subnano holes was discussed.