Production of Silicon Oxide like Thin Films by the Use of Atmospheric Plasma Torch

15th Latin American Workshop on Plasma Physics; 21st IAEA TM on Research Using Small Fusion Devices

Ozono, E.M.^1 ; Fachini, E.R.^2 ; Silva, M.L.P.^1,3 ; Ruchko, L.F.^4 ; Galvão, R.M.O.^4

Faculty of Technology of São Paulo- FATECSP, SP, Brazil^1

University of Puerto Rico, Río Piedras Campus, Puerto Rico^2

PSI-EPUSP, University of São Paulo, SP, Brazil^3

Institute of Physics, University of São Paulo, SP, Brazil^4

关键词: Adsorptive capability;    Atmospheric plasma torch;    Hexamethyldisilazane;    Inorganic matrices;    Organic components;    Oxide structures;    Piezoelectric quartz crystals;    Sensor applications;   

Others  :  https://iopscience.iop.org/article/10.1088/1742-6596/591/1/012041/pdf
DOI  :  10.1088/1742-6596/591/1/012041

来源: IOP

【 摘 要 】

The advantages of HMDS (hexamethyldisilazane) APT-plasma films for sensor applications were explored producing films in a three-turn copper coil APT equipment. HMDS was introduced into the argon plasma at four different conditions. Additional flux of oxygen could modulate the presence of organic components in the film, the composition varying from pure inorganic oxides to organo-silane polymers. Oxygen promoted deposition rates as high as 900 nm/min on silicon, acrylic or piezoelectric quartz crystal substrates. Films with a clustered morphology and refractive index of 1.45 were obtained, mainly due to a silicon oxide structure. Raman spectroscopy and XPS data showed the presence of CHnand amorphous carbon in the inorganic matrix. The films were sensitive to the humidity of the air. The adsorptive capabilities of outstanding films were tested in a Quartz Crystal Microbalance (QCM). The results support that those films can be a useful and simple alternative for the development of sensors.